New salicidation technology with Ni(Pt) alloy for MOSFETs

10.1109/55.974579

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Bibliographic Details
Main Authors:	Lee, P.S., Pey, K.L., Mangelinck, D., Ding, J., Chi, D.Z., Chan, L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Ni(Pt)Si NiSi Salicidation
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82755
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Institution:	National University of Singapore

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