Densification of radio frequency sputtered silicon oxide films by rapid thermal annealing

Journal of Applied Physics

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Bibliographic Details
Main Authors:	Choi, W.K., Choo, C.K., Han, K.K., Chen, J.H., Loh, F.C., Tan, K.L.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/80347
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Institution:	National University of Singapore

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