Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
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sg-nus-scholar.10635-810492015-01-08T16:25:51Z Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition Ren, Z.M. Lu, Y.F. Ho, D.H.K. Chong, T.C. Cheong, B.A. Pang, S.I. Wang, J.P. Li, K. ELECTRICAL ENGINEERING Carbon nitride Laser ablation Raman spectroscopy Thin films XPS Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 38 8 B 4859-4862 JAPLD 2014-10-07T03:04:06Z 2014-10-07T03:04:06Z 1999-08-15 Article Ren, Z.M.,Lu, Y.F.,Ho, D.H.K.,Chong, T.C.,Cheong, B.A.,Pang, S.I.,Wang, J.P.,Li, K. (1999-08-15). Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 38 (8 B) : 4859-4862. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/81049 NOT_IN_WOS Scopus |
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Carbon nitride Laser ablation Raman spectroscopy Thin films XPS |
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Carbon nitride Laser ablation Raman spectroscopy Thin films XPS Ren, Z.M. Lu, Y.F. Ho, D.H.K. Chong, T.C. Cheong, B.A. Pang, S.I. Wang, J.P. Li, K. Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition |
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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Ren, Z.M. Lu, Y.F. Ho, D.H.K. Chong, T.C. Cheong, B.A. Pang, S.I. Wang, J.P. Li, K. |
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Article |
author |
Ren, Z.M. Lu, Y.F. Ho, D.H.K. Chong, T.C. Cheong, B.A. Pang, S.I. Wang, J.P. Li, K. |
author_sort |
Ren, Z.M. |
title |
Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition |
title_short |
Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition |
title_full |
Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition |
title_fullStr |
Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition |
title_full_unstemmed |
Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition |
title_sort |
raman spectroscopy studies of the influence of substrate temperature and ion beam energy on cnx thin films deposited by nitrogen-ion-assisted pulsed laser deposition |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/81049 |
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1681089000530509824 |