Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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Main Authors: Ren, Z.M., Lu, Y.F., Ho, D.H.K., Chong, T.C., Cheong, B.A., Pang, S.I., Wang, J.P., Li, K.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
XPS
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81049
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-810492015-01-08T16:25:51Z Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition Ren, Z.M. Lu, Y.F. Ho, D.H.K. Chong, T.C. Cheong, B.A. Pang, S.I. Wang, J.P. Li, K. ELECTRICAL ENGINEERING Carbon nitride Laser ablation Raman spectroscopy Thin films XPS Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 38 8 B 4859-4862 JAPLD 2014-10-07T03:04:06Z 2014-10-07T03:04:06Z 1999-08-15 Article Ren, Z.M.,Lu, Y.F.,Ho, D.H.K.,Chong, T.C.,Cheong, B.A.,Pang, S.I.,Wang, J.P.,Li, K. (1999-08-15). Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 38 (8 B) : 4859-4862. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/81049 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
topic Carbon nitride
Laser ablation
Raman spectroscopy
Thin films
XPS
spellingShingle Carbon nitride
Laser ablation
Raman spectroscopy
Thin films
XPS
Ren, Z.M.
Lu, Y.F.
Ho, D.H.K.
Chong, T.C.
Cheong, B.A.
Pang, S.I.
Wang, J.P.
Li, K.
Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition
description Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Ren, Z.M.
Lu, Y.F.
Ho, D.H.K.
Chong, T.C.
Cheong, B.A.
Pang, S.I.
Wang, J.P.
Li, K.
format Article
author Ren, Z.M.
Lu, Y.F.
Ho, D.H.K.
Chong, T.C.
Cheong, B.A.
Pang, S.I.
Wang, J.P.
Li, K.
author_sort Ren, Z.M.
title Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition
title_short Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition
title_full Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition
title_fullStr Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition
title_full_unstemmed Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition
title_sort raman spectroscopy studies of the influence of substrate temperature and ion beam energy on cnx thin films deposited by nitrogen-ion-assisted pulsed laser deposition
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/81049
_version_ 1681089000530509824