Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Bibliographic Details
Main Authors: Zhao, Y., Khursheed, A.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81340
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Institution: National University of Singapore