Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Bibliographic Details
Main Authors: Zhao, Y., Khursheed, A.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81340
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-813402015-02-07T15:38:31Z Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems Zhao, Y. Khursheed, A. ELECTRICAL ENGINEERING Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 17 6 2795-2796 JVTBD 2014-10-07T03:07:15Z 2014-10-07T03:07:15Z 1999 Article Zhao, Y.,Khursheed, A. (1999). Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 17 (6) : 2795-2796. ScholarBank@NUS Repository. 10711023 http://scholarbank.nus.edu.sg/handle/10635/81340 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Zhao, Y.
Khursheed, A.
format Article
author Zhao, Y.
Khursheed, A.
spellingShingle Zhao, Y.
Khursheed, A.
Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
author_sort Zhao, Y.
title Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
title_short Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
title_full Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
title_fullStr Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
title_full_unstemmed Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
title_sort variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/81340
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