New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current

Annual Proceedings - Reliability Physics (Symposium)

Saved in:

Bibliographic Details
Main Authors:	Lau, W.S., Chan, D.S.H., Phang, J.C.H., Chow, K.W., Pey, K.S., Lim, Y.P., Cronquist, B.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81587
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-81587
record_format	dspace
spelling	sg-nus-scholar.10635-815872015-02-05T21:06:57Z New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. ELECTRICAL ENGINEERING Annual Proceedings - Reliability Physics (Symposium) 190-198 ARLPB 2014-10-07T03:09:53Z 2014-10-07T03:09:53Z 1993 Conference Paper Lau, W.S.,Chan, D.S.H.,Phang, J.C.H.,Chow, K.W.,Pey, K.S.,Lim, Y.P.,Cronquist, B. (1993). New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current. Annual Proceedings - Reliability Physics (Symposium) : 190-198. ScholarBank@NUS Repository. 0780307828 00999512 http://scholarbank.nus.edu.sg/handle/10635/81587 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Annual Proceedings - Reliability Physics (Symposium)
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B.
format	Conference or Workshop Item
author	Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B.
spellingShingle	Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
author_sort	Lau, W.S.
title	New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
title_short	New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
title_full	New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
title_fullStr	New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
title_full_unstemmed	New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
title_sort	new low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. true oxide electron beam induced current
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81587
_version_	1681089098387816448

New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current

Similar Items