Numerical prediction of etched profile in pyrolytic laser etching

10.1117/12.280576

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Bibliographic Details
Main Authors:	Wee, T.S., Lu, Y.F., Chim, W.K.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Carbon tetrachloride Diffused reflection Finite element method Heat conduction analysis Laser etched profile Laser induced temperature profile Numerical laser etching model Pyrolytic laser etching Silicon
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81621
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-81621
record_format	dspace
spelling	sg-nus-scholar.10635-816212024-11-14T10:20:39Z Numerical prediction of etched profile in pyrolytic laser etching Wee, T.S. Lu, Y.F. Chim, W.K. ELECTRICAL ENGINEERING PHYSICS Carbon tetrachloride Diffused reflection Finite element method Heat conduction analysis Laser etched profile Laser induced temperature profile Numerical laser etching model Pyrolytic laser etching Silicon 10.1117/12.280576 Proceedings of SPIE - The International Society for Optical Engineering 3184 211-220 PSISD 2014-10-07T03:10:16Z 2014-10-07T03:10:16Z 1997 Conference Paper Wee, T.S., Lu, Y.F., Chim, W.K. (1997). Numerical prediction of etched profile in pyrolytic laser etching. Proceedings of SPIE - The International Society for Optical Engineering 3184 : 211-220. ScholarBank@NUS Repository. https://doi.org/10.1117/12.280576 0277786X http://scholarbank.nus.edu.sg/handle/10635/81621 A1997BJ51B00026 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Carbon tetrachloride Diffused reflection Finite element method Heat conduction analysis Laser etched profile Laser induced temperature profile Numerical laser etching model Pyrolytic laser etching Silicon
spellingShingle	Carbon tetrachloride Diffused reflection Finite element method Heat conduction analysis Laser etched profile Laser induced temperature profile Numerical laser etching model Pyrolytic laser etching Silicon Wee, T.S. Lu, Y.F. Chim, W.K. Numerical prediction of etched profile in pyrolytic laser etching
description	10.1117/12.280576
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Wee, T.S. Lu, Y.F. Chim, W.K.
format	Conference or Workshop Item
author	Wee, T.S. Lu, Y.F. Chim, W.K.
author_sort	Wee, T.S.
title	Numerical prediction of etched profile in pyrolytic laser etching
title_short	Numerical prediction of etched profile in pyrolytic laser etching
title_full	Numerical prediction of etched profile in pyrolytic laser etching
title_fullStr	Numerical prediction of etched profile in pyrolytic laser etching
title_full_unstemmed	Numerical prediction of etched profile in pyrolytic laser etching
title_sort	numerical prediction of etched profile in pyrolytic laser etching
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81621
_version_	1821190871064772608

Numerical prediction of etched profile in pyrolytic laser etching

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