Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas

• Main Authors: Jun, D., Wei, J., Png, C.E., Guangyuan, S., Son, J., Yang, H., Danner, A.J.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/82115
• Institution: National University of Singapore

10.1116/1.3674282