Dry etching of LiNbO3 using inductively coupled Plasma

10.1109/PGC.2010.5706006

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Bibliographic Details
Main Authors: Deng, J., Si, G., Danner, A.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83650
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Institution: National University of Singapore