Dry etching of LiNbO3 using inductively coupled Plasma
10.1109/PGC.2010.5706006
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Main Authors: | Deng, J., Si, G., Danner, A.J. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83650 |
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Institution: | National University of Singapore |
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