Dry etching of LiNbO3 using inductively coupled Plasma

10.1109/PGC.2010.5706006

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Bibliographic Details
Main Authors: Deng, J., Si, G., Danner, A.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83650
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-836502024-11-08T20:04:18Z Dry etching of LiNbO3 using inductively coupled Plasma Deng, J. Si, G. Danner, A.J. ELECTRICAL & COMPUTER ENGINEERING 10.1109/PGC.2010.5706006 2010 Photonics Global Conference, PGC 2010 - 2014-10-07T04:43:37Z 2014-10-07T04:43:37Z 2010 Conference Paper Deng, J.,Si, G.,Danner, A.J. (2010). Dry etching of LiNbO3 using inductively coupled Plasma. 2010 Photonics Global Conference, PGC 2010 : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/PGC.2010.5706006" target="_blank">https://doi.org/10.1109/PGC.2010.5706006</a> 9781424498826 http://scholarbank.nus.edu.sg/handle/10635/83650 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1109/PGC.2010.5706006
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Deng, J.
Si, G.
Danner, A.J.
format Conference or Workshop Item
author Deng, J.
Si, G.
Danner, A.J.
spellingShingle Deng, J.
Si, G.
Danner, A.J.
Dry etching of LiNbO3 using inductively coupled Plasma
author_sort Deng, J.
title Dry etching of LiNbO3 using inductively coupled Plasma
title_short Dry etching of LiNbO3 using inductively coupled Plasma
title_full Dry etching of LiNbO3 using inductively coupled Plasma
title_fullStr Dry etching of LiNbO3 using inductively coupled Plasma
title_full_unstemmed Dry etching of LiNbO3 using inductively coupled Plasma
title_sort dry etching of linbo3 using inductively coupled plasma
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83650
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