Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas

10.1116/1.3674282

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Bibliographic Details
Main Authors: Jun, D., Wei, J., Png, C.E., Guangyuan, S., Son, J., Yang, H., Danner, A.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82115
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-821152024-11-13T13:21:56Z Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas Jun, D. Wei, J. Png, C.E. Guangyuan, S. Son, J. Yang, H. Danner, A.J. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.3674282 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 30 1 - JVTBD 2014-10-07T04:25:34Z 2014-10-07T04:25:34Z 2012-01 Article Jun, D., Wei, J., Png, C.E., Guangyuan, S., Son, J., Yang, H., Danner, A.J. (2012-01). Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 30 (1) : -. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3674282 10711023 http://scholarbank.nus.edu.sg/handle/10635/82115 000299388200016 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.3674282
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Jun, D.
Wei, J.
Png, C.E.
Guangyuan, S.
Son, J.
Yang, H.
Danner, A.J.
format Article
author Jun, D.
Wei, J.
Png, C.E.
Guangyuan, S.
Son, J.
Yang, H.
Danner, A.J.
spellingShingle Jun, D.
Wei, J.
Png, C.E.
Guangyuan, S.
Son, J.
Yang, H.
Danner, A.J.
Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas
author_sort Jun, D.
title Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas
title_short Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas
title_full Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas
title_fullStr Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas
title_full_unstemmed Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas
title_sort deep anisotropic linbo 3 etching with sf 6/ar inductively coupled plasmas
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82115
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