Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas
10.1116/1.3674282
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sg-nus-scholar.10635-821152024-11-13T13:21:56Z Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas Jun, D. Wei, J. Png, C.E. Guangyuan, S. Son, J. Yang, H. Danner, A.J. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.3674282 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 30 1 - JVTBD 2014-10-07T04:25:34Z 2014-10-07T04:25:34Z 2012-01 Article Jun, D., Wei, J., Png, C.E., Guangyuan, S., Son, J., Yang, H., Danner, A.J. (2012-01). Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 30 (1) : -. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3674282 10711023 http://scholarbank.nus.edu.sg/handle/10635/82115 000299388200016 Scopus |
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10.1116/1.3674282 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Jun, D. Wei, J. Png, C.E. Guangyuan, S. Son, J. Yang, H. Danner, A.J. |
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Jun, D. Wei, J. Png, C.E. Guangyuan, S. Son, J. Yang, H. Danner, A.J. |
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Jun, D. Wei, J. Png, C.E. Guangyuan, S. Son, J. Yang, H. Danner, A.J. Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas |
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Jun, D. |
title |
Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas |
title_short |
Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas |
title_full |
Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas |
title_fullStr |
Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas |
title_full_unstemmed |
Deep anisotropic LiNbO 3 etching with SF 6/Ar inductively coupled plasmas |
title_sort |
deep anisotropic linbo 3 etching with sf 6/ar inductively coupled plasmas |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/82115 |
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