Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process

Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process

10.1088/0960-1317/23/6/065026

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Bibliographic Details
Main Authors: Zhou, H., Kropelnicki, P., Tsai, J.M., Lee, C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82144
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/82144

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