Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process
10.1088/0960-1317/23/6/065026
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sg-nus-scholar.10635-821442024-11-09T08:00:13Z Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process Zhou, H. Kropelnicki, P. Tsai, J.M. Lee, C. ELECTRICAL & COMPUTER ENGINEERING 10.1088/0960-1317/23/6/065026 Journal of Micromechanics and Microengineering 23 6 - JMMIE 2014-10-07T04:25:55Z 2014-10-07T04:25:55Z 2013-06 Article Zhou, H., Kropelnicki, P., Tsai, J.M., Lee, C. (2013-06). Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process. Journal of Micromechanics and Microengineering 23 (6) : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0960-1317/23/6/065026 09601317 http://scholarbank.nus.edu.sg/handle/10635/82144 000319451300026 Scopus |
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10.1088/0960-1317/23/6/065026 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Zhou, H. Kropelnicki, P. Tsai, J.M. Lee, C. |
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Zhou, H. Kropelnicki, P. Tsai, J.M. Lee, C. |
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Zhou, H. Kropelnicki, P. Tsai, J.M. Lee, C. Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process |
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Zhou, H. |
title |
Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process |
title_short |
Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process |
title_full |
Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process |
title_fullStr |
Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process |
title_full_unstemmed |
Development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the CMOS process |
title_sort |
development of a thermopile infrared sensor using stacked double polycrystalline silicon layers based on the cmos process |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/82144 |
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