Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks

10.1063/1.2372313

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Main Authors: Samanta, P., Man, T.Y., Zhang, Q., Zhu, C., Chan, M.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82160
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-821602024-11-10T18:36:22Z Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks Samanta, P. Man, T.Y. Zhang, Q. Zhu, C. Chan, M. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2372313 Journal of Applied Physics 100 9 - JAPIA 2014-10-07T04:26:06Z 2014-10-07T04:26:06Z 2006 Article Samanta, P., Man, T.Y., Zhang, Q., Zhu, C., Chan, M. (2006). Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks. Journal of Applied Physics 100 (9) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2372313 00218979 http://scholarbank.nus.edu.sg/handle/10635/82160 000242041500110 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.2372313
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Samanta, P.
Man, T.Y.
Zhang, Q.
Zhu, C.
Chan, M.
format Article
author Samanta, P.
Man, T.Y.
Zhang, Q.
Zhu, C.
Chan, M.
spellingShingle Samanta, P.
Man, T.Y.
Zhang, Q.
Zhu, C.
Chan, M.
Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks
author_sort Samanta, P.
title Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks
title_short Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks
title_full Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks
title_fullStr Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks
title_full_unstemmed Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks
title_sort direct tunneling stress-induced leakage current in ultrathin hfo 2sio2 gate dielectric stacks
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82160
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