Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks
10.1063/1.2372313
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sg-nus-scholar.10635-821602024-11-10T18:36:22Z Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks Samanta, P. Man, T.Y. Zhang, Q. Zhu, C. Chan, M. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2372313 Journal of Applied Physics 100 9 - JAPIA 2014-10-07T04:26:06Z 2014-10-07T04:26:06Z 2006 Article Samanta, P., Man, T.Y., Zhang, Q., Zhu, C., Chan, M. (2006). Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks. Journal of Applied Physics 100 (9) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2372313 00218979 http://scholarbank.nus.edu.sg/handle/10635/82160 000242041500110 Scopus |
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10.1063/1.2372313 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Samanta, P. Man, T.Y. Zhang, Q. Zhu, C. Chan, M. |
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Samanta, P. Man, T.Y. Zhang, Q. Zhu, C. Chan, M. |
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Samanta, P. Man, T.Y. Zhang, Q. Zhu, C. Chan, M. Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks |
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Samanta, P. |
title |
Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks |
title_short |
Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks |
title_full |
Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks |
title_fullStr |
Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks |
title_full_unstemmed |
Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks |
title_sort |
direct tunneling stress-induced leakage current in ultrathin hfo 2sio2 gate dielectric stacks |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/82160 |
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