Effects of CF4 plasma on the field emission properties of aligned multi-wall carbon nanotube films

Effects of CF4 plasma on the field emission properties of aligned multi-wall carbon nanotube films

10.1016/j.carbon.2004.09.029

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Bibliographic Details
Main Authors: Zhu, Y.W., Cheong, F.C., Yu, T., Xu, X.J., Lim, C.T., Thong, J.T.L., Shen, Z.X., Ong, C.K., Liu, Y.J., Wee, A.T.S., Sow, C.H.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
A. Carbon nanotubes
B. Etching
D. Field emission
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82222
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Institution: National University of Singapore

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