Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition
10.1007/s00339-002-1452-2
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sg-nus-scholar.10635-825412024-11-10T16:36:48Z Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition Goh, Y.W. Lu, Y.F. Ren, Z.M. Chong, T.C. ELECTRICAL & COMPUTER ENGINEERING 10.1007/s00339-002-1452-2 Applied Physics A: Materials Science and Processing 77 3-4 433-439 APAMF 2014-10-07T04:30:35Z 2014-10-07T04:30:35Z 2003-08 Article Goh, Y.W., Lu, Y.F., Ren, Z.M., Chong, T.C. (2003-08). Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition. Applied Physics A: Materials Science and Processing 77 (3-4) : 433-439. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-002-1452-2 09478396 http://scholarbank.nus.edu.sg/handle/10635/82541 000184296000016 Scopus |
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10.1007/s00339-002-1452-2 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Goh, Y.W. Lu, Y.F. Ren, Z.M. Chong, T.C. |
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Goh, Y.W. Lu, Y.F. Ren, Z.M. Chong, T.C. |
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Goh, Y.W. Lu, Y.F. Ren, Z.M. Chong, T.C. Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition |
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Goh, Y.W. |
title |
Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition |
title_short |
Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition |
title_full |
Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition |
title_fullStr |
Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition |
title_full_unstemmed |
Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition |
title_sort |
influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/82541 |
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1821182229424898048 |