MOS Characteristics of synthesized HfAlON-HfO2 stack using AlN-HfO2

10.1109/LED.2004.834246

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Bibliographic Details
Main Authors:	Park, C.S., Cho, B.J., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82723
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82723
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spelling	sg-nus-scholar.10635-827232024-11-14T01:24:59Z MOS Characteristics of synthesized HfAlON-HfO2 stack using AlN-HfO2 Park, C.S. Cho, B.J. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 10.1109/LED.2004.834246 IEEE Electron Device Letters 25 9 619-621 EDLED 2014-10-07T04:32:45Z 2014-10-07T04:32:45Z 2004-09 Article Park, C.S., Cho, B.J., Kwong, D.-L. (2004-09). MOS Characteristics of synthesized HfAlON-HfO2 stack using AlN-HfO2. IEEE Electron Device Letters 25 (9) : 619-621. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2004.834246 07413106 http://scholarbank.nus.edu.sg/handle/10635/82723 000223577600010 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1109/LED.2004.834246
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Park, C.S. Cho, B.J. Kwong, D.-L.
format	Article
author	Park, C.S. Cho, B.J. Kwong, D.-L.
spellingShingle	Park, C.S. Cho, B.J. Kwong, D.-L. MOS Characteristics of synthesized HfAlON-HfO2 stack using AlN-HfO2
author_sort	Park, C.S.
title	MOS Characteristics of synthesized HfAlON-HfO2 stack using AlN-HfO2
title_short	MOS Characteristics of synthesized HfAlON-HfO2 stack using AlN-HfO2
title_full	MOS Characteristics of synthesized HfAlON-HfO2 stack using AlN-HfO2
title_fullStr	MOS Characteristics of synthesized HfAlON-HfO2 stack using AlN-HfO2
title_full_unstemmed	MOS Characteristics of synthesized HfAlON-HfO2 stack using AlN-HfO2
title_sort	mos characteristics of synthesized hfalon-hfo2 stack using aln-hfo2
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82723
_version_	1821223094878994432

MOS Characteristics of synthesized HfAlON-HfO2 stack using AlN-HfO2

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