Selective wet etching process for Ni-InGaAs contact formation in InGaAs N-MOSFETs with self-aligned source and drain
10.1149/2.020201jes
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sg-nus-scholar.10635-830012024-11-10T04:42:37Z Selective wet etching process for Ni-InGaAs contact formation in InGaAs N-MOSFETs with self-aligned source and drain Subramanian, S. Ivana Zhou, Q. Zhang, X. Balakrishnan, M. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1149/2.020201jes Journal of the Electrochemical Society 159 1 H16-H21 JESOA 2014-10-07T04:36:03Z 2014-10-07T04:36:03Z 2012 Article Subramanian, S., Ivana, Zhou, Q., Zhang, X., Balakrishnan, M., Yeo, Y.-C. (2012). Selective wet etching process for Ni-InGaAs contact formation in InGaAs N-MOSFETs with self-aligned source and drain. Journal of the Electrochemical Society 159 (1) : H16-H21. ScholarBank@NUS Repository. https://doi.org/10.1149/2.020201jes 00134651 http://scholarbank.nus.edu.sg/handle/10635/83001 000298253200045 Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Subramanian, S. Ivana Zhou, Q. Zhang, X. Balakrishnan, M. Yeo, Y.-C. |
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Article |
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Subramanian, S. Ivana Zhou, Q. Zhang, X. Balakrishnan, M. Yeo, Y.-C. |
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Subramanian, S. Ivana Zhou, Q. Zhang, X. Balakrishnan, M. Yeo, Y.-C. Selective wet etching process for Ni-InGaAs contact formation in InGaAs N-MOSFETs with self-aligned source and drain |
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Subramanian, S. |
title |
Selective wet etching process for Ni-InGaAs contact formation in InGaAs N-MOSFETs with self-aligned source and drain |
title_short |
Selective wet etching process for Ni-InGaAs contact formation in InGaAs N-MOSFETs with self-aligned source and drain |
title_full |
Selective wet etching process for Ni-InGaAs contact formation in InGaAs N-MOSFETs with self-aligned source and drain |
title_fullStr |
Selective wet etching process for Ni-InGaAs contact formation in InGaAs N-MOSFETs with self-aligned source and drain |
title_full_unstemmed |
Selective wet etching process for Ni-InGaAs contact formation in InGaAs N-MOSFETs with self-aligned source and drain |
title_sort |
selective wet etching process for ni-ingaas contact formation in ingaas n-mosfets with self-aligned source and drain |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/83001 |
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