Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid

10.1149/2.026309jss

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Main Authors:	Liu, L., Lin, F., Heinrich, M., Aberle, A.G., Hoex, B.
Other Authors:	SOLAR ENERGY RESEARCH INST OF S'PORE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83250
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83250
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spelling	sg-nus-scholar.10635-832502023-10-29T20:28:12Z Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid Liu, L. Lin, F. Heinrich, M. Aberle, A.G. Hoex, B. SOLAR ENERGY RESEARCH INST OF S'PORE ELECTRICAL & COMPUTER ENGINEERING 10.1149/2.026309jss ECS Journal of Solid State Science and Technology 2 9 P380-P383 2014-10-07T04:39:03Z 2014-10-07T04:39:03Z 2013 Article Liu, L., Lin, F., Heinrich, M., Aberle, A.G., Hoex, B. (2013). Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid. ECS Journal of Solid State Science and Technology 2 (9) : P380-P383. ScholarBank@NUS Repository. https://doi.org/10.1149/2.026309jss 21628769 http://scholarbank.nus.edu.sg/handle/10635/83250 000321620800015 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/2.026309jss
author2	SOLAR ENERGY RESEARCH INST OF S'PORE
author_facet	SOLAR ENERGY RESEARCH INST OF S'PORE Liu, L. Lin, F. Heinrich, M. Aberle, A.G. Hoex, B.
format	Article
author	Liu, L. Lin, F. Heinrich, M. Aberle, A.G. Hoex, B.
spellingShingle	Liu, L. Lin, F. Heinrich, M. Aberle, A.G. Hoex, B. Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid
author_sort	Liu, L.
title	Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid
title_short	Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid
title_full	Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid
title_fullStr	Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid
title_full_unstemmed	Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid
title_sort	unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83250
_version_	1781784342750560256

Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid

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