Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acid
10.1149/2.026309jss
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Main Authors: | Liu, L., Lin, F., Heinrich, M., Aberle, A.G., Hoex, B. |
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Other Authors: | SOLAR ENERGY RESEARCH INST OF S'PORE |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83250 |
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Institution: | National University of Singapore |
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