Versatile pattern generation of periodic, high aspect ratio Si nanostructure arrays with sub-50-nm resolution on a wafer scale

Versatile pattern generation of periodic, high aspect ratio Si nanostructure arrays with sub-50-nm resolution on a wafer scale

10.1186/1556-276X-8-506

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Bibliographic Details
Main Authors: Ho, J.-W., Wee, Q., Dumond, J., Tay, A., Chua, S.-J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Metal-catalyzed electroless etching
Non-porous
Si nanostructures
Step-and-repeat nanoimprint lithography
Sub-50-nm resolution
User-defined patterns
Wafer scale
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83256
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/83256

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