Versatile pattern generation of periodic, high aspect ratio Si nanostructure arrays with sub-50-nm resolution on a wafer scale

• Main Authors: Ho, J.-W., Wee, Q., Dumond, J., Tay, A., Chua, S.-J.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Subjects: Metal-catalyzed electroless etching; Non-porous; Si nanostructures; Step-and-repeat nanoimprint lithography; Sub-50-nm resolution; User-defined patterns; Wafer scale
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83256
• Institution: National University of Singapore

10.1186/1556-276X-8-506