A new source/drain germanium-enrichment process comprising Ge deposition and laser-induced local melting and recrystallization for P-FET performance enhancement
10.1109/VLSIT.2008.4588550
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2014
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sg-nus-scholar.10635-833902015-01-08T05:36:54Z A new source/drain germanium-enrichment process comprising Ge deposition and laser-induced local melting and recrystallization for P-FET performance enhancement Liu, F. Wong, H.-S. Ang, K.-W. Zhu, M. Wang, X. Lai, D.M.-Y. Lim, P.-C. Tan, B.L.H. Tripathy, S. Oh, S.-A. Samudra, G.S. Balasubramanian, N. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/VLSIT.2008.4588550 Digest of Technical Papers - Symposium on VLSI Technology 26-27 DTPTE 2014-10-07T04:40:41Z 2014-10-07T04:40:41Z 2008 Conference Paper Liu, F.,Wong, H.-S.,Ang, K.-W.,Zhu, M.,Wang, X.,Lai, D.M.-Y.,Lim, P.-C.,Tan, B.L.H.,Tripathy, S.,Oh, S.-A.,Samudra, G.S.,Balasubramanian, N.,Yeo, Y.-C. (2008). A new source/drain germanium-enrichment process comprising Ge deposition and laser-induced local melting and recrystallization for P-FET performance enhancement. Digest of Technical Papers - Symposium on VLSI Technology : 26-27. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/VLSIT.2008.4588550" target="_blank">https://doi.org/10.1109/VLSIT.2008.4588550</a> 9781424418053 07431562 http://scholarbank.nus.edu.sg/handle/10635/83390 NOT_IN_WOS Scopus |
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10.1109/VLSIT.2008.4588550 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Liu, F. Wong, H.-S. Ang, K.-W. Zhu, M. Wang, X. Lai, D.M.-Y. Lim, P.-C. Tan, B.L.H. Tripathy, S. Oh, S.-A. Samudra, G.S. Balasubramanian, N. Yeo, Y.-C. |
format |
Conference or Workshop Item |
author |
Liu, F. Wong, H.-S. Ang, K.-W. Zhu, M. Wang, X. Lai, D.M.-Y. Lim, P.-C. Tan, B.L.H. Tripathy, S. Oh, S.-A. Samudra, G.S. Balasubramanian, N. Yeo, Y.-C. |
spellingShingle |
Liu, F. Wong, H.-S. Ang, K.-W. Zhu, M. Wang, X. Lai, D.M.-Y. Lim, P.-C. Tan, B.L.H. Tripathy, S. Oh, S.-A. Samudra, G.S. Balasubramanian, N. Yeo, Y.-C. A new source/drain germanium-enrichment process comprising Ge deposition and laser-induced local melting and recrystallization for P-FET performance enhancement |
author_sort |
Liu, F. |
title |
A new source/drain germanium-enrichment process comprising Ge deposition and laser-induced local melting and recrystallization for P-FET performance enhancement |
title_short |
A new source/drain germanium-enrichment process comprising Ge deposition and laser-induced local melting and recrystallization for P-FET performance enhancement |
title_full |
A new source/drain germanium-enrichment process comprising Ge deposition and laser-induced local melting and recrystallization for P-FET performance enhancement |
title_fullStr |
A new source/drain germanium-enrichment process comprising Ge deposition and laser-induced local melting and recrystallization for P-FET performance enhancement |
title_full_unstemmed |
A new source/drain germanium-enrichment process comprising Ge deposition and laser-induced local melting and recrystallization for P-FET performance enhancement |
title_sort |
new source/drain germanium-enrichment process comprising ge deposition and laser-induced local melting and recrystallization for p-fet performance enhancement |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/83390 |
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1681089427090178048 |