Uniaxial strained silicon n-FETs on silicon-germanium-on-insulator substrates with an e-Si0.7Ge0.3 stress transfer layer and source/drain stressors for performance enhancement

Uniaxial strained silicon n-FETs on silicon-germanium-on-insulator substrates with an e-Si0.7Ge0.3 stress transfer layer and source/drain stressors for performance enhancement

10.1109/ESSDERC.2007.4430940

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Bibliographic Details
Main Authors: Wang, G.H., Toh, E.-H., Foo, Y.-L., Tripathy, S., Balakumar, S., Lo, G.-Q., Samudra, G., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84341
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/84341

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