Preparation of polymer-silicon(100) hybrids via interface-initiated reversible addition-fragmentation chain-transfer (RAFT) polymerization

by Peng, Q., Lai, D.M.Y., Kang, E.T., Neoh, K.G.
Published 2014

ToF-SIMS studies of poly(methyl methacrylate-co-methacrylic acid), poly(2,2,3,3,3-pentafluoropropyl methacrylate-co-4-vinylpyridine) and their blends

by Huang, H.L., Goh, S.H., Lai, D.M.Y., Huan, C.H.A.
Published 2014

Germanium incorporation in Hf O2 dielectric on germanium substrate

by Zhang, Q., Wu, N., Lai, D.M.Y., Nikolai, Y., Bera, L.K., Zhu, C.
Published 2014

Miscibility and Surface Properties of Fluorinated Copolymer Blends Involving Hydrogen-Bonding Interactions

by Huang, H.L., Goh, S.H., Lai, D.M.Y., Wee, A.T.S., Huan, C.H.A.
Published 2014

Surface properties of miscible poly(1,1,1,3,3,3-hexafluoroisopropyl methacrylate)/phenoxy blends

by Huang, H.L., Goh, S.H., Lai, D.M.Y., Huan, C.H.A., Wee, A.T.S.
Published 2014

Enhanced Ge MOS device performance through a novel post-gate CF 4-plasma treatment process

by Xie, R., Thamarai, M., Sun, Z., Yu, M., Lai, D.M.Y., Chan, L., Zhu, C.
Published 2014

Surface characterization of C60-Containing poly(ethyl methacrylate)/poly(ethyl methacrylate) blends

by Huang, H.L., Goh, S.H., Zheng, J.W., Lai, D.M.Y., Huan, C.H.A.
Published 2014

Plasma polymerization of allylpentafluorobenzene on copper surfaces

by Yang, G.H., Zhang, Y., Kang, E.T., Neoh, K.G., Huan, A.C.H., Lai, D.M.Y.
Published 2014

Surface modification of SiLK® by graft copolymerization with 4-vinylpyridine for reduction in copper diffusion

by Zhu, Y.Q., Kang, E.T., Neoh, K.G., Chan, L., Lai, D.M.Y., Huan, A.C.H.
Published 2014

Characterization of fluoropolymer films deposited by magnetron sputtering of poly(tetrafluoroethylene) and plasma polymerization of heptadecafluoro-1-decene (HDFD) on (100)-oriente...

by Zhang, Y., Yang, G.H., Kang, E.T., Neoh, K.G., Huang, W., Huan, A.C.H., Lai, D.M.Y.
Published 2014

Metal-gate work function modulation using hafnium alloys obtained by the interdiffusion of thin metallic layers

by Lim, A.E.-J., Hwang, W.S., Wang, X.P., Lai, D.M.Y., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C.
Published 2014

Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs

by Liu, F., Wong, H.-S., Ang, K.-W., Zhu, M., Wang, X., Lai, D.M.-Y., Lim, P.-C., Yeo, Y.-C.
Published 2014

Incorporation of tin in boron doped silicon for reduced deactivation of boron during post-laser-anneal rapid thermal processing

by Liu, F., Tan, K.-M., Wang, X., Low, D.K.Y., Lai, D.M.Y., Lim, P.C., Samudra, G., Yeo, Y.-C.
Published 2014

Nickel-aluminum alloy silicides with high aluminum content for contact resistance reduction and integration in n-channel field-effect transistors

by Koh, A.T.-Y., Lee, R.T.-P., Lim, A.E.-J., Lai, D.M.-Y., Chi, D.-Z., Hoe, K.-M., Balasubramanian, N., Samudra, G.S., Yeo, Y.-C.
Published 2014

Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix

by Chew, H.G., Choi, W.K., Foo, Y.L., Zheng, F., Chim, W.K., Voon, Z.J., Seow, K.C., Fitzgerald, E.A., Lai, D.M.Y.
Published 2014

Band edge NMOS work function for nickel fully-silicided (FUSI) gate obtained by the insertion of novel Y-, Tb-, and Yb-based interlayers

by Lim, A.E.-J., Lee, R.T.P., Wang, X.P., Hwang, W.S., Tung, C.-H., Lai, D.M.Y., Samudra, G., Kwong, D.-L., Yeo, Y.-C.
Published 2014

A new source/drain germanium-enrichment process comprising Ge deposition and laser-induced local melting and recrystallization for P-FET performance enhancement

by Liu, F., Wong, H.-S., Ang, K.-W., Zhu, M., Wang, X., Lai, D.M.-Y., Lim, P.-C., Tan, B.L.H., Tripathy, S., Oh, S.-A., Samudra, G.S., Balasubramanian, N., Yeo, Y.-C.
Published 2014

Novel nickel-alloy suicides for source/drain contact resistance reduction in N-channel multiple-gate transistors with sub-35nm gate length

by Lee, R.T.P., Liow, T.-Y., Tan, K.-M., Lim, A.E.-J., Wong, H.-S., Lim, P.-C., Lai, D.M.Y., Lo, G.-Q., Tung, C.-H., Samudra, G., Chi, D.-Z., Yeo, Y.-C.
Published 2014

Nickel-silicide: Carbon contact technology for N-channel MOSFETs with silicon-carbon source/drain

by Lee, R.T.P., Yang, L.-T., Liow, T.-Y., Tan, K.-M., Lim, A.E.-J., Ang, K.-W., Lai, D.M.Y., Hoe, K.M., Lo, G.-Q., Samudra, G.S., Chi, D.Z., Yeo, Y.-C.
Published 2014