Characterization of ultrashallow dopant profiles using spreading resistance profiling
10.1116/1.1426370
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sg-nus-scholar.10635-835452023-10-30T07:14:11Z Characterization of ultrashallow dopant profiles using spreading resistance profiling Tan, L.S. Tan, L.C.P. Leong, M.S. Mazur, R.G. Ye, C.W. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.1426370 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 20 1 483-487 JVTBD 2014-10-07T04:42:25Z 2014-10-07T04:42:25Z 2002-01 Conference Paper Tan, L.S., Tan, L.C.P., Leong, M.S., Mazur, R.G., Ye, C.W. (2002-01). Characterization of ultrashallow dopant profiles using spreading resistance profiling. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 20 (1) : 483-487. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1426370 10711023 http://scholarbank.nus.edu.sg/handle/10635/83545 000173985500090 Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Tan, L.S. Tan, L.C.P. Leong, M.S. Mazur, R.G. Ye, C.W. |
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Conference or Workshop Item |
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Tan, L.S. Tan, L.C.P. Leong, M.S. Mazur, R.G. Ye, C.W. |
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Tan, L.S. Tan, L.C.P. Leong, M.S. Mazur, R.G. Ye, C.W. Characterization of ultrashallow dopant profiles using spreading resistance profiling |
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Tan, L.S. |
title |
Characterization of ultrashallow dopant profiles using spreading resistance profiling |
title_short |
Characterization of ultrashallow dopant profiles using spreading resistance profiling |
title_full |
Characterization of ultrashallow dopant profiles using spreading resistance profiling |
title_fullStr |
Characterization of ultrashallow dopant profiles using spreading resistance profiling |
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Characterization of ultrashallow dopant profiles using spreading resistance profiling |
title_sort |
characterization of ultrashallow dopant profiles using spreading resistance profiling |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/83545 |
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1781784366319403008 |