Characterization of ultrashallow dopant profiles using spreading resistance profiling

10.1116/1.1426370

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Bibliographic Details
Main Authors: Tan, L.S., Tan, L.C.P., Leong, M.S., Mazur, R.G., Ye, C.W.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83545
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Institution: National University of Singapore

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