Dopant profile control of epitaxial emitter for silicon solar cells by low temperature epitaxy

We report an alternative approach to grow phosphorus-doped epitaxial silicon emitter by rapid thermal chemical vapor deposition at low temperature (T ≥ 700 °C). A power conversion efficiency (PCE) of (6.6 ± 0.3)% and a pseudo PCE of (10.2 ± 0.2)% has been achieved for the solar cell with epi-emitter...

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Bibliographic Details
Main Authors: Lai, Donny, Tan, Yew Heng, Gunawan, Oki, He, Lining, Tan, Chuan Seng
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2017
Subjects:
Online Access:https://hdl.handle.net/10356/86545
http://hdl.handle.net/10220/44101
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Institution: Nanyang Technological University
Language: English