Characterization of ultrashallow dopant profiles using spreading resistance profiling

• Main Authors: Tan, L.S., Tan, L.C.P., Leong, M.S., Mazur, R.G., Ye, C.W.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83545
• Institution: National University of Singapore

10.1116/1.1426370