Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 films
Materials Research Society Symposium - Proceedings
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2014
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sg-nus-scholar.10635-837292024-11-14T21:23:36Z Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 films Choi, W.K. Ng, V. Ho, Y.W. Chen, T.B. Ho, V. ELECTRICAL & COMPUTER ENGINEERING Materials Research Society Symposium - Proceedings 638 F1411-F1416 MRSPD 2014-10-07T04:44:30Z 2014-10-07T04:44:30Z 2001 Conference Paper Choi, W.K.,Ng, V.,Ho, Y.W.,Chen, T.B.,Ho, V. (2001). Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 films. Materials Research Society Symposium - Proceedings 638 : F1411-F1416. ScholarBank@NUS Repository. 02729172 http://scholarbank.nus.edu.sg/handle/10635/83729 NOT_IN_WOS Scopus |
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Materials Research Society Symposium - Proceedings |
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ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Choi, W.K. Ng, V. Ho, Y.W. Chen, T.B. Ho, V. |
| format |
Conference or Workshop Item |
| author |
Choi, W.K. Ng, V. Ho, Y.W. Chen, T.B. Ho, V. |
| spellingShingle |
Choi, W.K. Ng, V. Ho, Y.W. Chen, T.B. Ho, V. Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 films |
| author_sort |
Choi, W.K. |
| title |
Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 films |
| title_short |
Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 films |
| title_full |
Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 films |
| title_fullStr |
Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 films |
| title_full_unstemmed |
Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 films |
| title_sort |
factors affecting ge nanocrystal size in co-sputtered ge+sio2 films |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/83729 |
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