High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operation

Technical Digest - International Electron Devices Meeting, IEDM

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Bibliographic Details
Main Authors:	Tan, Y.N., Chim, W.K., Choi, W.K., Joo, M.S., Ng, T.H., Cho, B.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83797
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-837972015-01-23T09:26:23Z High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operation Tan, Y.N. Chim, W.K. Choi, W.K. Joo, M.S. Ng, T.H. Cho, B.J. ELECTRICAL & COMPUTER ENGINEERING Technical Digest - International Electron Devices Meeting, IEDM 889-890 TDIMD 2014-10-07T04:45:18Z 2014-10-07T04:45:18Z 2004 Conference Paper Tan, Y.N.,Chim, W.K.,Choi, W.K.,Joo, M.S.,Ng, T.H.,Cho, B.J. (2004). High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operation. Technical Digest - International Electron Devices Meeting, IEDM : 889-890. ScholarBank@NUS Repository. 01631918 http://scholarbank.nus.edu.sg/handle/10635/83797 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Technical Digest - International Electron Devices Meeting, IEDM
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Tan, Y.N. Chim, W.K. Choi, W.K. Joo, M.S. Ng, T.H. Cho, B.J.
format	Conference or Workshop Item
author	Tan, Y.N. Chim, W.K. Choi, W.K. Joo, M.S. Ng, T.H. Cho, B.J.
spellingShingle	Tan, Y.N. Chim, W.K. Choi, W.K. Joo, M.S. Ng, T.H. Cho, B.J. High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operation
author_sort	Tan, Y.N.
title	High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operation
title_short	High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operation
title_full	High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operation
title_fullStr	High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operation
title_full_unstemmed	High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operation
title_sort	high-k hfalo charge trapping layer in sonos-type nonvolatile memory device for high speed operation
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83797
_version_	1681089502041341952

High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operation

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