Surface roughness control of the Al and Al2O3 thin films deposited by using pulsed DC magnetron sputtering

Materials Research Society Symposium - Proceedings

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Main Authors: Qiu, J., Li, K., Han, G., Guo, Z., Wu, Y.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84262
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-842622015-01-07T06:38:28Z Surface roughness control of the Al and Al2O3 thin films deposited by using pulsed DC magnetron sputtering Qiu, J. Li, K. Han, G. Guo, Z. Wu, Y. PHYSICS ELECTRICAL & COMPUTER ENGINEERING Materials Research Society Symposium - Proceedings 672 O8.36.1-O8.36.6 MRSPD 2014-10-07T04:50:40Z 2014-10-07T04:50:40Z 2001 Conference Paper Qiu, J.,Li, K.,Han, G.,Guo, Z.,Wu, Y. (2001). Surface roughness control of the Al and Al2O3 thin films deposited by using pulsed DC magnetron sputtering. Materials Research Society Symposium - Proceedings 672 : O8.36.1-O8.36.6. ScholarBank@NUS Repository. 02729172 http://scholarbank.nus.edu.sg/handle/10635/84262 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Materials Research Society Symposium - Proceedings
author2 PHYSICS
author_facet PHYSICS
Qiu, J.
Li, K.
Han, G.
Guo, Z.
Wu, Y.
format Conference or Workshop Item
author Qiu, J.
Li, K.
Han, G.
Guo, Z.
Wu, Y.
spellingShingle Qiu, J.
Li, K.
Han, G.
Guo, Z.
Wu, Y.
Surface roughness control of the Al and Al2O3 thin films deposited by using pulsed DC magnetron sputtering
author_sort Qiu, J.
title Surface roughness control of the Al and Al2O3 thin films deposited by using pulsed DC magnetron sputtering
title_short Surface roughness control of the Al and Al2O3 thin films deposited by using pulsed DC magnetron sputtering
title_full Surface roughness control of the Al and Al2O3 thin films deposited by using pulsed DC magnetron sputtering
title_fullStr Surface roughness control of the Al and Al2O3 thin films deposited by using pulsed DC magnetron sputtering
title_full_unstemmed Surface roughness control of the Al and Al2O3 thin films deposited by using pulsed DC magnetron sputtering
title_sort surface roughness control of the al and al2o3 thin films deposited by using pulsed dc magnetron sputtering
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84262
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