Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor

Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor

10.1088/0957-4484/23/31/315304

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Bibliographic Details
Main Authors: Ganesan, R., Dinachali, S.S., Lim, S.H., Saifullah, M.S.M., Chong, W.T., Lim, A.H.H., Yong, J.J., Thian, E.S., He, C., Low, H.Y.
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85012
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/85012

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