Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor

10.1088/0957-4484/23/31/315304

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Main Authors:	Ganesan, R., Dinachali, S.S., Lim, S.H., Saifullah, M.S.M., Chong, W.T., Lim, A.H.H., Yong, J.J., Thian, E.S., He, C., Low, H.Y.
Other Authors:	MATERIALS SCIENCE AND ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/85012
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-850122023-10-30T21:14:54Z Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor Ganesan, R. Dinachali, S.S. Lim, S.H. Saifullah, M.S.M. Chong, W.T. Lim, A.H.H. Yong, J.J. Thian, E.S. He, C. Low, H.Y. MATERIALS SCIENCE AND ENGINEERING MECHANICAL ENGINEERING 10.1088/0957-4484/23/31/315304 Nanotechnology 23 31 - NNOTE 2014-10-07T09:02:57Z 2014-10-07T09:02:57Z 2012-08-10 Article Ganesan, R., Dinachali, S.S., Lim, S.H., Saifullah, M.S.M., Chong, W.T., Lim, A.H.H., Yong, J.J., Thian, E.S., He, C., Low, H.Y. (2012-08-10). Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor. Nanotechnology 23 (31) : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0957-4484/23/31/315304 09574484 http://scholarbank.nus.edu.sg/handle/10635/85012 000306516100008 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1088/0957-4484/23/31/315304
author2	MATERIALS SCIENCE AND ENGINEERING
author_facet	MATERIALS SCIENCE AND ENGINEERING Ganesan, R. Dinachali, S.S. Lim, S.H. Saifullah, M.S.M. Chong, W.T. Lim, A.H.H. Yong, J.J. Thian, E.S. He, C. Low, H.Y.
format	Article
author	Ganesan, R. Dinachali, S.S. Lim, S.H. Saifullah, M.S.M. Chong, W.T. Lim, A.H.H. Yong, J.J. Thian, E.S. He, C. Low, H.Y.
spellingShingle	Ganesan, R. Dinachali, S.S. Lim, S.H. Saifullah, M.S.M. Chong, W.T. Lim, A.H.H. Yong, J.J. Thian, E.S. He, C. Low, H.Y. Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
author_sort	Ganesan, R.
title	Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
title_short	Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
title_full	Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
title_fullStr	Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
title_full_unstemmed	Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
title_sort	direct nanoimprint lithography of al 2o 3 using a chelated monomer-based precursor
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/85012
_version_	1781784559906455552

Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor

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