Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor

10.1088/0957-4484/23/31/315304

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Main Authors: Ganesan, R., Dinachali, S.S., Lim, S.H., Saifullah, M.S.M., Chong, W.T., Lim, A.H.H., Yong, J.J., Thian, E.S., He, C., Low, H.Y.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85012
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spelling sg-nus-scholar.10635-850122024-11-15T05:14:08Z Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor Ganesan, R. Dinachali, S.S. Lim, S.H. Saifullah, M.S.M. Chong, W.T. Lim, A.H.H. Yong, J.J. Thian, E.S. He, C. Low, H.Y. MECHANICAL ENGINEERING MATERIALS SCIENCE AND ENGINEERING 10.1088/0957-4484/23/31/315304 Nanotechnology 23 31 - NNOTE 2014-10-07T09:02:57Z 2014-10-07T09:02:57Z 2012-08-10 Article Ganesan, R., Dinachali, S.S., Lim, S.H., Saifullah, M.S.M., Chong, W.T., Lim, A.H.H., Yong, J.J., Thian, E.S., He, C., Low, H.Y. (2012-08-10). Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor. Nanotechnology 23 (31) : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0957-4484/23/31/315304 09574484 http://scholarbank.nus.edu.sg/handle/10635/85012 000306516100008 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1088/0957-4484/23/31/315304
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
Ganesan, R.
Dinachali, S.S.
Lim, S.H.
Saifullah, M.S.M.
Chong, W.T.
Lim, A.H.H.
Yong, J.J.
Thian, E.S.
He, C.
Low, H.Y.
format Article
author Ganesan, R.
Dinachali, S.S.
Lim, S.H.
Saifullah, M.S.M.
Chong, W.T.
Lim, A.H.H.
Yong, J.J.
Thian, E.S.
He, C.
Low, H.Y.
spellingShingle Ganesan, R.
Dinachali, S.S.
Lim, S.H.
Saifullah, M.S.M.
Chong, W.T.
Lim, A.H.H.
Yong, J.J.
Thian, E.S.
He, C.
Low, H.Y.
Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
author_sort Ganesan, R.
title Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
title_short Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
title_full Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
title_fullStr Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
title_full_unstemmed Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor
title_sort direct nanoimprint lithography of al 2o 3 using a chelated monomer-based precursor
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/85012
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