Selective electroless plating of copper on (100)-oriented single crystal silicon surface modified by UV-induced coupling of 4-vinylpyridine with the H-Terminated silicon

10.1021/jp026308p

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Main Authors: Xu, D., Kang, E.T., Neoh, K.G., Zhang, Y., Tay, A.A.O., Ang, S.S., Lo, M.C.Y., Vaidyanathan, K.
Other Authors: CHEMICAL & ENVIRONMENTAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85619
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spelling sg-nus-scholar.10635-856192023-10-30T08:38:02Z Selective electroless plating of copper on (100)-oriented single crystal silicon surface modified by UV-induced coupling of 4-vinylpyridine with the H-Terminated silicon Xu, D. Kang, E.T. Neoh, K.G. Zhang, Y. Tay, A.A.O. Ang, S.S. Lo, M.C.Y. Vaidyanathan, K. CHEMICAL & ENVIRONMENTAL ENGINEERING MECHANICAL ENGINEERING 10.1021/jp026308p Journal of Physical Chemistry B 106 48 12508-12516 JPCBF 2014-10-07T09:10:08Z 2014-10-07T09:10:08Z 2002-12-05 Article Xu, D., Kang, E.T., Neoh, K.G., Zhang, Y., Tay, A.A.O., Ang, S.S., Lo, M.C.Y., Vaidyanathan, K. (2002-12-05). Selective electroless plating of copper on (100)-oriented single crystal silicon surface modified by UV-induced coupling of 4-vinylpyridine with the H-Terminated silicon. Journal of Physical Chemistry B 106 (48) : 12508-12516. ScholarBank@NUS Repository. https://doi.org/10.1021/jp026308p 10895647 http://scholarbank.nus.edu.sg/handle/10635/85619 000179618200021 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1021/jp026308p
author2 CHEMICAL & ENVIRONMENTAL ENGINEERING
author_facet CHEMICAL & ENVIRONMENTAL ENGINEERING
Xu, D.
Kang, E.T.
Neoh, K.G.
Zhang, Y.
Tay, A.A.O.
Ang, S.S.
Lo, M.C.Y.
Vaidyanathan, K.
format Article
author Xu, D.
Kang, E.T.
Neoh, K.G.
Zhang, Y.
Tay, A.A.O.
Ang, S.S.
Lo, M.C.Y.
Vaidyanathan, K.
spellingShingle Xu, D.
Kang, E.T.
Neoh, K.G.
Zhang, Y.
Tay, A.A.O.
Ang, S.S.
Lo, M.C.Y.
Vaidyanathan, K.
Selective electroless plating of copper on (100)-oriented single crystal silicon surface modified by UV-induced coupling of 4-vinylpyridine with the H-Terminated silicon
author_sort Xu, D.
title Selective electroless plating of copper on (100)-oriented single crystal silicon surface modified by UV-induced coupling of 4-vinylpyridine with the H-Terminated silicon
title_short Selective electroless plating of copper on (100)-oriented single crystal silicon surface modified by UV-induced coupling of 4-vinylpyridine with the H-Terminated silicon
title_full Selective electroless plating of copper on (100)-oriented single crystal silicon surface modified by UV-induced coupling of 4-vinylpyridine with the H-Terminated silicon
title_fullStr Selective electroless plating of copper on (100)-oriented single crystal silicon surface modified by UV-induced coupling of 4-vinylpyridine with the H-Terminated silicon
title_full_unstemmed Selective electroless plating of copper on (100)-oriented single crystal silicon surface modified by UV-induced coupling of 4-vinylpyridine with the H-Terminated silicon
title_sort selective electroless plating of copper on (100)-oriented single crystal silicon surface modified by uv-induced coupling of 4-vinylpyridine with the h-terminated silicon
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/85619
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