Low stress silicon nitride layers for MEMS applications
10.1117/12.696350
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sg-nus-scholar.10635-860072023-10-26T22:02:14Z Low stress silicon nitride layers for MEMS applications Iliescu, C. Wei, J. Chen, B. Ong, P.L. Tay, F.E.H. MECHANICAL ENGINEERING High frequency High power Low stress PECVD Silicon nitride 10.1117/12.696350 Proceedings of SPIE - The International Society for Optical Engineering 6415 - PSISD 2014-10-07T09:14:46Z 2014-10-07T09:14:46Z 2007 Conference Paper Iliescu, C., Wei, J., Chen, B., Ong, P.L., Tay, F.E.H. (2007). Low stress silicon nitride layers for MEMS applications. Proceedings of SPIE - The International Society for Optical Engineering 6415 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.696350 0819465232 0277786X http://scholarbank.nus.edu.sg/handle/10635/86007 000245723600017 Scopus |
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High frequency High power Low stress PECVD Silicon nitride |
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High frequency High power Low stress PECVD Silicon nitride Iliescu, C. Wei, J. Chen, B. Ong, P.L. Tay, F.E.H. Low stress silicon nitride layers for MEMS applications |
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10.1117/12.696350 |
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MECHANICAL ENGINEERING |
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MECHANICAL ENGINEERING Iliescu, C. Wei, J. Chen, B. Ong, P.L. Tay, F.E.H. |
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Conference or Workshop Item |
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Iliescu, C. Wei, J. Chen, B. Ong, P.L. Tay, F.E.H. |
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Iliescu, C. |
title |
Low stress silicon nitride layers for MEMS applications |
title_short |
Low stress silicon nitride layers for MEMS applications |
title_full |
Low stress silicon nitride layers for MEMS applications |
title_fullStr |
Low stress silicon nitride layers for MEMS applications |
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Low stress silicon nitride layers for MEMS applications |
title_sort |
low stress silicon nitride layers for mems applications |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/86007 |
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1781784793752535040 |