Low stress silicon nitride layers for MEMS applications

Low stress silicon nitride layers for MEMS applications

10.1117/12.696350

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Bibliographic Details
Main Authors: Iliescu, C., Wei, J., Chen, B., Ong, P.L., Tay, F.E.H.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
High frequency
High power
Low stress
PECVD
Silicon nitride
Online Access:http://scholarbank.nus.edu.sg/handle/10635/86007
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/86007

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