Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy

10.1063/1.3156689

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Main Authors:	Chua, D.H.C., Hsieh, J., Gao, X., Qi, D., Chen, S., Varghese, B., Sow, C.H., Wee, A.T.S., Lu, J., Loh, K.P., Yu, X., Moser, H.O.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/86276
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-862762023-10-25T22:04:26Z Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy Chua, D.H.C. Hsieh, J. Gao, X. Qi, D. Chen, S. Varghese, B. Sow, C.H. Wee, A.T.S. Lu, J. Loh, K.P. Yu, X. Moser, H.O. PHYSICS SINGAPORE SYNCHROTRON LIGHT SOURCE CHEMISTRY NUS NANOSCIENCE & NANOTECH INITIATIVE MATERIALS SCIENCE AND ENGINEERING 10.1063/1.3156689 Journal of Applied Physics 106 2 - JAPIA 2014-10-07T09:48:48Z 2014-10-07T09:48:48Z 2009 Article Chua, D.H.C., Hsieh, J., Gao, X., Qi, D., Chen, S., Varghese, B., Sow, C.H., Wee, A.T.S., Lu, J., Loh, K.P., Yu, X., Moser, H.O. (2009). Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy. Journal of Applied Physics 106 (2) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3156689 00218979 http://scholarbank.nus.edu.sg/handle/10635/86276 000268613000154 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.3156689
author2	PHYSICS
author_facet	PHYSICS Chua, D.H.C. Hsieh, J. Gao, X. Qi, D. Chen, S. Varghese, B. Sow, C.H. Wee, A.T.S. Lu, J. Loh, K.P. Yu, X. Moser, H.O.
format	Article
author	Chua, D.H.C. Hsieh, J. Gao, X. Qi, D. Chen, S. Varghese, B. Sow, C.H. Wee, A.T.S. Lu, J. Loh, K.P. Yu, X. Moser, H.O.
spellingShingle	Chua, D.H.C. Hsieh, J. Gao, X. Qi, D. Chen, S. Varghese, B. Sow, C.H. Wee, A.T.S. Lu, J. Loh, K.P. Yu, X. Moser, H.O. Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy
author_sort	Chua, D.H.C.
title	Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy
title_short	Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy
title_full	Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy
title_fullStr	Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy
title_full_unstemmed	Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy
title_sort	effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/86276
_version_	1781784845230276608

Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy

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