Implementation of organic bottom anti-reflective coating in 0.35 μm polycide fabrication

• Main Authors: Ko, T.-M., Fan, M.-H., Cheng, A., Yu, R.
• Other Authors: CHEMICAL ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: Computer simulation; Masking linearity; Notching; Off-axis mumination; Optical proximity effect; Organic barc; Photoresist; Polycide; Reflectivity
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/91812
• Institution: National University of Singapore

10.1117/12.280541