Deposition of osmium and ruthenium thin films from organometallic cluster precursors

10.1002/aoc.1494

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Bibliographic Details
Main Authors: Li, C., Leong, W.K., Loh, K.P.
Other Authors: CHEMISTRY
Format: Article
Published: 2014
Subjects:
CVD
Online Access:http://scholarbank.nus.edu.sg/handle/10635/93531
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Institution: National University of Singapore