Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD

• Main Authors: Luo, L., Zybill, C.E., Ang, H.G., Lim, S.F., Chua, D.H.C., Lin, J., Wee, A.T.S., Tan, K.L.
• 其他作者: PHYSICS
• 格式: Article
• 出版: 2014
• 主題: FeSi films; Film composition; Film formation; Low-pressure chemical vapor deposition
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/94964
• 機構: National University of Singapore

Thin Solid Films