Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study

10.1002/sia.1909

Saved in:

Bibliographic Details
Main Authors:	Seah, M.P., Spencer, S.J., Bensebaa, F., Vickridge, I., Danzebrink, H., Krumrey, M., Gross, T., Oesterle, W., Wendler, E., Rheinländer, B., Azuma, Y., Kojima, I., Suzuki, N., Suzuki, M., Tanuma, S., Moon, D.W., Lee, H.J., Cho, H.M., Chen, H.Y., Wee, A.T.S., Osipowicz, T., Pan, J.S., Jordaan, W.A., Hauert, R., Klotz, U., Van Der Marel, C., Verheijen, M., Tamminga, Y., Jeynes, C., Bailey, P., Biswas, S., Falke, U., Nguyen, N.V., Chandler-Horowitz, D., Ehrstein, J.R., Muller, D., Dura, J.A.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Subjects:	Calibration Ellipsometry Gate oxides GIXRR Interlaboratory study MEIS Neutron reflectometry NRA RBS Silicon dioxide SIMS TEM Thickness measurement Traceability XPS
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/96128
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-96128
record_format	dspace
spelling	sg-nus-scholar.10635-961282024-11-12T21:16:40Z Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study Seah, M.P. Spencer, S.J. Bensebaa, F. Vickridge, I. Danzebrink, H. Krumrey, M. Gross, T. Oesterle, W. Wendler, E. Rheinländer, B. Azuma, Y. Kojima, I. Suzuki, N. Suzuki, M. Tanuma, S. Moon, D.W. Lee, H.J. Cho, H.M. Chen, H.Y. Wee, A.T.S. Osipowicz, T. Pan, J.S. Jordaan, W.A. Hauert, R. Klotz, U. Van Der Marel, C. Verheijen, M. Tamminga, Y. Jeynes, C. Bailey, P. Biswas, S. Falke, U. Nguyen, N.V. Chandler-Horowitz, D. Ehrstein, J.R. Muller, D. Dura, J.A. PHYSICS Calibration Ellipsometry Gate oxides GIXRR Interlaboratory study MEIS Neutron reflectometry NRA RBS Silicon dioxide SIMS TEM Thickness measurement Traceability XPS 10.1002/sia.1909 Surface and Interface Analysis 36 9 1269-1303 SIAND 2014-10-16T09:19:47Z 2014-10-16T09:19:47Z 2004-09 Article Seah, M.P., Spencer, S.J., Bensebaa, F., Vickridge, I., Danzebrink, H., Krumrey, M., Gross, T., Oesterle, W., Wendler, E., Rheinländer, B., Azuma, Y., Kojima, I., Suzuki, N., Suzuki, M., Tanuma, S., Moon, D.W., Lee, H.J., Cho, H.M., Chen, H.Y., Wee, A.T.S., Osipowicz, T., Pan, J.S., Jordaan, W.A., Hauert, R., Klotz, U., Van Der Marel, C., Verheijen, M., Tamminga, Y., Jeynes, C., Bailey, P., Biswas, S., Falke, U., Nguyen, N.V., Chandler-Horowitz, D., Ehrstein, J.R., Muller, D., Dura, J.A. (2004-09). Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study. Surface and Interface Analysis 36 (9) : 1269-1303. ScholarBank@NUS Repository. https://doi.org/10.1002/sia.1909 01422421 http://scholarbank.nus.edu.sg/handle/10635/96128 000224171100001 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Calibration Ellipsometry Gate oxides GIXRR Interlaboratory study MEIS Neutron reflectometry NRA RBS Silicon dioxide SIMS TEM Thickness measurement Traceability XPS
spellingShingle	Calibration Ellipsometry Gate oxides GIXRR Interlaboratory study MEIS Neutron reflectometry NRA RBS Silicon dioxide SIMS TEM Thickness measurement Traceability XPS Seah, M.P. Spencer, S.J. Bensebaa, F. Vickridge, I. Danzebrink, H. Krumrey, M. Gross, T. Oesterle, W. Wendler, E. Rheinländer, B. Azuma, Y. Kojima, I. Suzuki, N. Suzuki, M. Tanuma, S. Moon, D.W. Lee, H.J. Cho, H.M. Chen, H.Y. Wee, A.T.S. Osipowicz, T. Pan, J.S. Jordaan, W.A. Hauert, R. Klotz, U. Van Der Marel, C. Verheijen, M. Tamminga, Y. Jeynes, C. Bailey, P. Biswas, S. Falke, U. Nguyen, N.V. Chandler-Horowitz, D. Ehrstein, J.R. Muller, D. Dura, J.A. Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study
description	10.1002/sia.1909
author2	PHYSICS
author_facet	PHYSICS Seah, M.P. Spencer, S.J. Bensebaa, F. Vickridge, I. Danzebrink, H. Krumrey, M. Gross, T. Oesterle, W. Wendler, E. Rheinländer, B. Azuma, Y. Kojima, I. Suzuki, N. Suzuki, M. Tanuma, S. Moon, D.W. Lee, H.J. Cho, H.M. Chen, H.Y. Wee, A.T.S. Osipowicz, T. Pan, J.S. Jordaan, W.A. Hauert, R. Klotz, U. Van Der Marel, C. Verheijen, M. Tamminga, Y. Jeynes, C. Bailey, P. Biswas, S. Falke, U. Nguyen, N.V. Chandler-Horowitz, D. Ehrstein, J.R. Muller, D. Dura, J.A.
format	Article
author	Seah, M.P. Spencer, S.J. Bensebaa, F. Vickridge, I. Danzebrink, H. Krumrey, M. Gross, T. Oesterle, W. Wendler, E. Rheinländer, B. Azuma, Y. Kojima, I. Suzuki, N. Suzuki, M. Tanuma, S. Moon, D.W. Lee, H.J. Cho, H.M. Chen, H.Y. Wee, A.T.S. Osipowicz, T. Pan, J.S. Jordaan, W.A. Hauert, R. Klotz, U. Van Der Marel, C. Verheijen, M. Tamminga, Y. Jeynes, C. Bailey, P. Biswas, S. Falke, U. Nguyen, N.V. Chandler-Horowitz, D. Ehrstein, J.R. Muller, D. Dura, J.A.
author_sort	Seah, M.P.
title	Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study
title_short	Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study
title_full	Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study
title_fullStr	Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study
title_full_unstemmed	Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study
title_sort	critical review of the current status of thickness measurements for ultrathin sio 2 on si part v: results of a ccqm pilot study
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/96128
_version_	1821198191540830208

Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study

Similar Items