Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe

10.1063/1.2762277

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Bibliographic Details
Main Authors:	Mi, Y.Y., Wang, S.J., Chai, J.W., Seng, H.L., Pan, J.S., Foo, Y.L., Huan, C.H.A., Ong, C.K.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/96313
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-96313
record_format	dspace
spelling	sg-nus-scholar.10635-963132023-10-26T21:13:14Z Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe Mi, Y.Y. Wang, S.J. Chai, J.W. Seng, H.L. Pan, J.S. Foo, Y.L. Huan, C.H.A. Ong, C.K. PHYSICS 10.1063/1.2762277 Applied Physics Letters 91 4 - APPLA 2014-10-16T09:21:58Z 2014-10-16T09:21:58Z 2007 Article Mi, Y.Y., Wang, S.J., Chai, J.W., Seng, H.L., Pan, J.S., Foo, Y.L., Huan, C.H.A., Ong, C.K. (2007). Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe. Applied Physics Letters 91 (4) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2762277 00036951 http://scholarbank.nus.edu.sg/handle/10635/96313 000248345500042 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.2762277
author2	PHYSICS
author_facet	PHYSICS Mi, Y.Y. Wang, S.J. Chai, J.W. Seng, H.L. Pan, J.S. Foo, Y.L. Huan, C.H.A. Ong, C.K.
format	Article
author	Mi, Y.Y. Wang, S.J. Chai, J.W. Seng, H.L. Pan, J.S. Foo, Y.L. Huan, C.H.A. Ong, C.K.
spellingShingle	Mi, Y.Y. Wang, S.J. Chai, J.W. Seng, H.L. Pan, J.S. Foo, Y.L. Huan, C.H.A. Ong, C.K. Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe
author_sort	Mi, Y.Y.
title	Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe
title_short	Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe
title_full	Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe
title_fullStr	Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe
title_full_unstemmed	Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe
title_sort	effect of interfacial oxynitride layer on the band alignment and thermal stability of laalo3 films on sige
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/96313
_version_	1781786429983031296

Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe

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