Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials

Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials

10.1166/jnn.2005.084

Saved in:
Bibliographic Details
Main Authors: Xie, J.L., Lin, J.Y., Wang, Y.H., Narayanan, B., Wang, M.R., Kumar, R.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Carbon-Doped
Low-k Material
PECVD
Thermal Stability
TMCTS
Online Access:http://scholarbank.nus.edu.sg/handle/10635/96345
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/96345

Similar Items