Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials
10.1166/jnn.2005.084
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Main Authors: | Xie, J.L., Lin, J.Y., Wang, Y.H., Narayanan, B., Wang, M.R., Kumar, R. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/96345 |
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Institution: | National University of Singapore |
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