Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials
10.1166/jnn.2005.084
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sg-nus-scholar.10635-963452023-10-30T07:28:53Z Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials Xie, J.L. Lin, J.Y. Wang, Y.H. Narayanan, B. Wang, M.R. Kumar, R. PHYSICS Carbon-Doped Low-k Material PECVD Thermal Stability TMCTS 10.1166/jnn.2005.084 Journal of Nanoscience and Nanotechnology 5 4 550-557 2014-10-16T09:22:21Z 2014-10-16T09:22:21Z 2005 Article Xie, J.L., Lin, J.Y., Wang, Y.H., Narayanan, B., Wang, M.R., Kumar, R. (2005). Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials. Journal of Nanoscience and Nanotechnology 5 (4) : 550-557. ScholarBank@NUS Repository. https://doi.org/10.1166/jnn.2005.084 15334880 http://scholarbank.nus.edu.sg/handle/10635/96345 000229119800006 Scopus |
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Carbon-Doped Low-k Material PECVD Thermal Stability TMCTS Xie, J.L. Lin, J.Y. Wang, Y.H. Narayanan, B. Wang, M.R. Kumar, R. Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials |
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10.1166/jnn.2005.084 |
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PHYSICS |
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PHYSICS Xie, J.L. Lin, J.Y. Wang, Y.H. Narayanan, B. Wang, M.R. Kumar, R. |
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Article |
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Xie, J.L. Lin, J.Y. Wang, Y.H. Narayanan, B. Wang, M.R. Kumar, R. |
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Xie, J.L. |
title |
Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials |
title_short |
Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials |
title_full |
Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials |
title_fullStr |
Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials |
title_full_unstemmed |
Effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials |
title_sort |
effect of thermal treatment on carbon-doped silicon oxide low dielectric constant materials |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/96345 |
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