Thermal cure study of a low-k methyl silsesquioxane for intermetal dielectric application by FT-IR spectroscopy
Applied Spectroscopy
Saved in:
Main Authors: | , , |
---|---|
Other Authors: | |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/98354 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
id |
sg-nus-scholar.10635-98354 |
---|---|
record_format |
dspace |
spelling |
sg-nus-scholar.10635-983542015-02-20T07:30:51Z Thermal cure study of a low-k methyl silsesquioxane for intermetal dielectric application by FT-IR spectroscopy Wang, C.Y. Shen, Z.X. Zheng, J.Z. PHYSICS Applied Spectroscopy 54 2 209-213 APSPA 2014-10-16T09:46:06Z 2014-10-16T09:46:06Z 2000-02 Article Wang, C.Y.,Shen, Z.X.,Zheng, J.Z. (2000-02). Thermal cure study of a low-k methyl silsesquioxane for intermetal dielectric application by FT-IR spectroscopy. Applied Spectroscopy 54 (2) : 209-213. ScholarBank@NUS Repository. 00037028 http://scholarbank.nus.edu.sg/handle/10635/98354 NOT_IN_WOS Scopus |
institution |
National University of Singapore |
building |
NUS Library |
country |
Singapore |
collection |
ScholarBank@NUS |
description |
Applied Spectroscopy |
author2 |
PHYSICS |
author_facet |
PHYSICS Wang, C.Y. Shen, Z.X. Zheng, J.Z. |
format |
Article |
author |
Wang, C.Y. Shen, Z.X. Zheng, J.Z. |
spellingShingle |
Wang, C.Y. Shen, Z.X. Zheng, J.Z. Thermal cure study of a low-k methyl silsesquioxane for intermetal dielectric application by FT-IR spectroscopy |
author_sort |
Wang, C.Y. |
title |
Thermal cure study of a low-k methyl silsesquioxane for intermetal dielectric application by FT-IR spectroscopy |
title_short |
Thermal cure study of a low-k methyl silsesquioxane for intermetal dielectric application by FT-IR spectroscopy |
title_full |
Thermal cure study of a low-k methyl silsesquioxane for intermetal dielectric application by FT-IR spectroscopy |
title_fullStr |
Thermal cure study of a low-k methyl silsesquioxane for intermetal dielectric application by FT-IR spectroscopy |
title_full_unstemmed |
Thermal cure study of a low-k methyl silsesquioxane for intermetal dielectric application by FT-IR spectroscopy |
title_sort |
thermal cure study of a low-k methyl silsesquioxane for intermetal dielectric application by ft-ir spectroscopy |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/98354 |
_version_ |
1681092008659124224 |