Exposure parameters in proton beam writing for KMPR and EPO Core negative tone photoresists

Exposure parameters in proton beam writing for KMPR and EPO Core negative tone photoresists

10.1016/j.nimb.2011.02.027

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Bibliographic Details
Main Authors: Ynsa, M.D., Shao, P., Kulkarni, S.R., Liu, N.N., Van Kan, J.A.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98701
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/98701

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