Central composite designs coupled with simulation techniques for optimizing RIE process

• Main Authors: Leksakul K., Limcharoen A.
• Format: Article
• Language: English
• Published: 2014
• Online Access: http://www.scopus.com/inward/record.url?eid=2-s2.0-84896731284&partnerID=40&md5=1e413254f7ac3ab72261d0b925f23bee; http://cmuir.cmu.ac.th/handle/6653943832/1655
• Institution: Chiang Mai University

This research paper develops an effective methodology to determine the optimum etching conditions for slider fabrication that meet hard disk drive (HDD) industrial targets using a reactive ion etching (RIE) machine of central composite design (CCD), coupled with RIE simulation. CCD is utilized to create an efficient analytical model for multi-response incorporating the RIE process parameters of pressure and coil and platen power. The research first determined the factors that cause production defects, using the design of experiments (DOE) method. Then, the most promising production parameters were selected. To optimize the parameters, an efficient CCD technique was proposed. Unfortunately, the CCD technique generated a large number of experimental combinations, leading to prohibitively high experimental costs. Simulation application software was used as a cost-efficient alternative, although RIE simulation and actual process parameters differ. Mathematical equations showing the parameter relationships were formulated. CCD interfaced with RIE simulation was further applied to find the optimal conditions for multi-responses. Finally, the optimal conditions obtained by desirability optimization technique were verified with experimental results and found to agree with HDD industrial standards. © 2013 Springer-Verlag London.